Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/92988
Title: | Simulation of energetic electron beam interaction with resist on semiconductor substrates using Monte Carlo process and its application to e_beam lithography |
Researcher: | Singh, Moirangthem Shubhakanta |
Guide(s): | Indrajit Sharma, B and Khatri, R K |
Keywords: | Electron-Solid Interactions, Elastic Scattering, Monte Carlo Method, Lithographic Strategies, X-Ray Lithography |
University: | Assam University |
Completed Date: | 2010 |
Abstract: | Abstract available newline newline |
Pagination: | Xvi, 110p. |
URI: | http://hdl.handle.net/10603/92988 |
Appears in Departments: | Department of Physics |
Files in This Item:
File | Description | Size | Format | |
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01_title.pdf | Attached File | 304.76 kB | Adobe PDF | View/Open |
02_declaration.pdf | 32.7 kB | Adobe PDF | View/Open | |
03_certificate.pdf | 59.28 kB | Adobe PDF | View/Open | |
04_acknowledgement.pdf | 88.7 kB | Adobe PDF | View/Open | |
05_contents.pdf | 72.38 kB | Adobe PDF | View/Open | |
06_list of figures and tables.pdf | 175.34 kB | Adobe PDF | View/Open | |
07_abstract.pdf | 179.72 kB | Adobe PDF | View/Open | |
08_chapter 1.pdf | 830.83 kB | Adobe PDF | View/Open | |
09_chapter 2.pdf | 691.43 kB | Adobe PDF | View/Open | |
10_chapter 3.pdf | 366.62 kB | Adobe PDF | View/Open | |
11_chapter 4.pdf | 255.3 kB | Adobe PDF | View/Open | |
12_chapter 5.pdf | 1.02 MB | Adobe PDF | View/Open | |
13_chapter 6.pdf | 1.18 MB | Adobe PDF | View/Open | |
14_research publications.pdf | 24.79 kB | Adobe PDF | View/Open | |
15_references.pdf | 176.75 kB | Adobe PDF | View/Open |
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