Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/92988
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DC FieldValueLanguage
dc.coverage.spatialPhysics
dc.date.accessioned2016-05-31T06:32:23Z-
dc.date.available2016-05-31T06:32:23Z-
dc.identifier.urihttp://hdl.handle.net/10603/92988-
dc.description.abstractAbstract available newline newline
dc.format.extentXvi, 110p.
dc.languageEnglish
dc.relationNo. of references 105
dc.rightsuniversity
dc.titleSimulation of energetic electron beam interaction with resist on semiconductor substrates using Monte Carlo process and its application to e_beam lithography
dc.title.alternative-
dc.creator.researcherSingh, Moirangthem Shubhakanta
dc.subject.keywordElectron-Solid Interactions, Elastic Scattering, Monte Carlo Method, Lithographic Strategies, X-Ray Lithography
dc.description.noteBibliography p. 107-110
dc.contributor.guideIndrajit Sharma, B and Khatri, R K
dc.publisher.placeSilchar
dc.publisher.universityAssam University
dc.publisher.institutionDepartment of Physics
dc.date.registeredn.d.
dc.date.completed2010
dc.date.awardedn.d.
dc.format.dimensions-
dc.format.accompanyingmaterialNone
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Physics

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01_title.pdfAttached File304.76 kBAdobe PDFView/Open
02_declaration.pdf32.7 kBAdobe PDFView/Open
03_certificate.pdf59.28 kBAdobe PDFView/Open
04_acknowledgement.pdf88.7 kBAdobe PDFView/Open
05_contents.pdf72.38 kBAdobe PDFView/Open
06_list of figures and tables.pdf175.34 kBAdobe PDFView/Open
07_abstract.pdf179.72 kBAdobe PDFView/Open
08_chapter 1.pdf830.83 kBAdobe PDFView/Open
09_chapter 2.pdf691.43 kBAdobe PDFView/Open
10_chapter 3.pdf366.62 kBAdobe PDFView/Open
11_chapter 4.pdf255.3 kBAdobe PDFView/Open
12_chapter 5.pdf1.02 MBAdobe PDFView/Open
13_chapter 6.pdf1.18 MBAdobe PDFView/Open
14_research publications.pdf24.79 kBAdobe PDFView/Open
15_references.pdf176.75 kBAdobe PDFView/Open


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