Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/88163
Title: | Approach to submicron pattern replication by an improved x ray source |
Researcher: | Dhar, Rakesh |
Guide(s): | Singh, Nirmal |
Keywords: | Submicron Replication Improved Lithography Electron |
University: | Panjab University |
Completed Date: | 31/05/1992 |
Abstract: | Abstract available |
Pagination: | xvi, 71p. |
URI: | http://hdl.handle.net/10603/88163 |
Appears in Departments: | Faculty of Science |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_title page.pdf | Attached File | 42.22 kB | Adobe PDF | View/Open |
02_dedication.pdf | 14.6 kB | Adobe PDF | View/Open | |
03_acknowledgement.pdf | 182.92 kB | Adobe PDF | View/Open | |
04_content.pdf | 80.74 kB | Adobe PDF | View/Open | |
05_figure captions.pdf | 155 kB | Adobe PDF | View/Open | |
06_abstract.pdf | 219.44 kB | Adobe PDF | View/Open | |
07_chapter 1.pdf | 654.88 kB | Adobe PDF | View/Open | |
08_chapter 2.pdf | 1.36 MB | Adobe PDF | View/Open | |
09_chapter 3.pdf | 1 MB | Adobe PDF | View/Open | |
10_chapter 4.pdf | 8.18 MB | Adobe PDF | View/Open | |
11_results and discussion.pdf | 6.79 MB | Adobe PDF | View/Open | |
12_references.pdf | 900.63 kB | Adobe PDF | View/Open | |
13_tables.pdf | 100.11 kB | Adobe PDF | View/Open |
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