Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/88163
Title: Approach to submicron pattern replication by an improved x ray source
Researcher: Dhar, Rakesh
Guide(s): Singh, Nirmal
Keywords: Submicron
Replication
Improved
Lithography
Electron
University: Panjab University
Completed Date: 31/05/1992
Abstract: Abstract available
Pagination: xvi, 71p.
URI: http://hdl.handle.net/10603/88163
Appears in Departments:Faculty of Science

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01_title page.pdfAttached File42.22 kBAdobe PDFView/Open
02_dedication.pdf14.6 kBAdobe PDFView/Open
03_acknowledgement.pdf182.92 kBAdobe PDFView/Open
04_content.pdf80.74 kBAdobe PDFView/Open
05_figure captions.pdf155 kBAdobe PDFView/Open
06_abstract.pdf219.44 kBAdobe PDFView/Open
07_chapter 1.pdf654.88 kBAdobe PDFView/Open
08_chapter 2.pdf1.36 MBAdobe PDFView/Open
09_chapter 3.pdf1 MBAdobe PDFView/Open
10_chapter 4.pdf8.18 MBAdobe PDFView/Open
11_results and discussion.pdf6.79 MBAdobe PDFView/Open
12_references.pdf900.63 kBAdobe PDFView/Open
13_tables.pdf100.11 kBAdobe PDFView/Open
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