Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/87483
Title: | Fabrication of optically transparent sin X ray mask membrane with low stress and high radiation durability |
Researcher: | Kumar, Rakesh |
Guide(s): | Bajpai, R P |
Keywords: | Lithography Technology Hydrogen Oxygen Fabrication |
University: | Panjab University |
Completed Date: | 31/12/1996 |
Abstract: | Abstract available |
Pagination: | xi, 186p. |
URI: | http://hdl.handle.net/10603/87483 |
Appears in Departments: | Faculty of Science |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_title page.pdf | Attached File | 40.93 kB | Adobe PDF | View/Open |
02_acknowledgement.pdf | 71.66 kB | Adobe PDF | View/Open | |
03_research publications.pdf | 186.26 kB | Adobe PDF | View/Open | |
04_content.pdf | 207.7 kB | Adobe PDF | View/Open | |
05_abstract.pdf | 275.78 kB | Adobe PDF | View/Open | |
06_chapter 1.pdf | 636.81 kB | Adobe PDF | View/Open | |
07_chapter 2.pdf | 1.29 MB | Adobe PDF | View/Open | |
08_chapter 3.pdf | 3.74 MB | Adobe PDF | View/Open | |
09_chapter 4.pdf | 3.91 MB | Adobe PDF | View/Open | |
10_chapter 5.pdf | 2.92 MB | Adobe PDF | View/Open | |
11_chapter 6.pdf | 3.06 MB | Adobe PDF | View/Open | |
12_references.pdf | 899.99 kB | Adobe PDF | View/Open |
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