1. Shodhganga@INFLIBNET
  2. Panjab University
  3. Department of Physics
Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/82951
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DC FieldValueLanguage
dc.coverage.spatialPhysics
dc.date.accessioned2016-04-19T05:21:43Z-
dc.date.available2016-04-19T05:21:43Z-
dc.identifier.urihttp://hdl.handle.net/10603/82951-
dc.description.abstractAbstract available
dc.format.extentix, 90p.
dc.languageEnglish
dc.relationReference available at chapters
dc.rightsuniversity
dc.titleECR based plasma assisted chemical etching of semiconductors
dc.title.alternative
dc.creator.researcherBhardwaj, Ram Krishan
dc.subject.keywordCyclotron
dc.subject.keywordElectron
dc.subject.keywordEtching
dc.subject.keywordPlasma
dc.subject.keywordSemiconductors
dc.description.noteData not available
dc.contributor.guideBharadwaj, Lalit M
dc.publisher.placeChandigarh
dc.publisher.universityPanjab University
dc.publisher.institutionDepartment of Physics
dc.date.registeredn.d.
dc.date.completed31/12/2006
dc.date.awardedn.d.
dc.format.dimensions72cm.
dc.format.accompanyingmaterialNone
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Physics

Files in This Item:
File Description SizeFormat 
01_title page.pdfAttached File39.38 kBAdobe PDFView/Open
02_dedication.pdf21.25 kBAdobe PDFView/Open
03_acknowledgement.pdf113.83 kBAdobe PDFView/Open
04_content.pdf108.41 kBAdobe PDFView/Open
05_abstract.pdf163.52 kBAdobe PDFView/Open
06_chapter 1.pdf1.12 MBAdobe PDFView/Open
07_chapter 2.pdf1.91 MBAdobe PDFView/Open
08_chapter 3.pdf1.68 MBAdobe PDFView/Open
09_chapter 4.pdf1.1 MBAdobe PDFView/Open
10_conclusion.pdf182.25 kBAdobe PDFView/Open
11_list of figures.pdf121.22 kBAdobe PDFView/Open
12_publication.pdf84.06 kBAdobe PDFView/Open
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