Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/567734
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dc.coverage.spatial
dc.date.accessioned2024-05-29T12:31:00Z-
dc.date.available2024-05-29T12:31:00Z-
dc.identifier.urihttp://hdl.handle.net/10603/567734-
dc.description.abstractnewline
dc.format.extent138p.
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleStudies on Silicon Carbide thin films fabricated by single composite target magnetron sputter deposition for Resistive Random Access Memory and Schottky barrier diode applications
dc.title.alternative
dc.creator.researcherPoreddy, Chaitanya Akshara
dc.subject.keywordMultidisciplinary
dc.subject.keywordMultidisciplinary Sciences
dc.subject.keywordPhysical Sciences
dc.description.note
dc.contributor.guideGhanashyam Krishna, M and Rajaram, G
dc.publisher.placeHyderabad
dc.publisher.universityUniversity of Hyderabad
dc.publisher.institutionCenter for Advanced Studies in Electronic Sciences and Technology (CASEST),
dc.date.registered2014
dc.date.completed2019
dc.date.awarded2019
dc.format.dimensions
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Center for Advanced Studies in Electronic Sciences and Technology (CASEST),

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80_recommendation.pdfAttached File2.06 MBAdobe PDFView/Open
annexures.pdf713.94 kBAdobe PDFView/Open
chapter-1.pdf837.65 kBAdobe PDFView/Open
chapter-2.pdf421.81 kBAdobe PDFView/Open
chapter-3.pdf2.62 MBAdobe PDFView/Open
chapter-4.pdf6.62 MBAdobe PDFView/Open
chapter-5.pdf3.48 MBAdobe PDFView/Open
contents.pdf596.11 kBAdobe PDFView/Open
prelim pages.pdf330.19 kBAdobe PDFView/Open
title page.pdf121.19 kBAdobe PDFView/Open


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