Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/54222
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DC FieldValueLanguage
dc.coverage.spatialen_US
dc.date.accessioned2015-10-20T08:26:54Z-
dc.date.available2015-10-20T08:26:54Z-
dc.date.issued2015-10-20-
dc.identifier.urihttp://hdl.handle.net/10603/54222-
dc.description.abstractNoneen_US
dc.format.extentix, 168p.en_US
dc.languageEnglishen_US
dc.relationen_US
dc.rightsuniversityen_US
dc.titlePreparation and characterization of RF sputtered oxide thin films for devicesen_US
dc.title.alternativeen_US
dc.creator.researcherJeyadheepan, Ken_US
dc.subject.keywordpreparation and characterizationen_US
dc.subject.keywordRF sputtered oxide thin filmsen_US
dc.description.noteen_US
dc.contributor.guideSanjeeviraja, Cen_US
dc.publisher.placeKaraikudien_US
dc.publisher.universityAlagappa Universityen_US
dc.publisher.institutionDepartment of Physicsen_US
dc.date.registered08/12/2005en_US
dc.date.completed26/03/2010en_US
dc.date.awarded23/03/2011en_US
dc.format.dimensionsen_US
dc.format.accompanyingmaterialDVDen_US
dc.source.universityUniversityen_US
dc.type.degreePh.D.en_US
Appears in Departments:Department of Physics

Files in This Item:
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01_title.pdfAttached File253.98 kBAdobe PDFView/Open
02_declaration.pdf106.38 kBAdobe PDFView/Open
03_certificate.pdf106.5 kBAdobe PDFView/Open
04_acknowledgement.pdf116.87 kBAdobe PDFView/Open
05_abstract.pdf113.77 kBAdobe PDFView/Open
06_contents.pdf120.34 kBAdobe PDFView/Open
07_chapter 1.pdf207.71 kBAdobe PDFView/Open
08_chapter 2.pdf187.49 kBAdobe PDFView/Open
09_chapter 3.pdf257.25 kBAdobe PDFView/Open
10_chapter 4.pdf178.85 kBAdobe PDFView/Open
11_chapter 5.pdf221.76 kBAdobe PDFView/Open
12_chapter 6.pdf191.63 kBAdobe PDFView/Open
13_chapter 7.pdf244.31 kBAdobe PDFView/Open
14_chapter 8.pdf175.48 kBAdobe PDFView/Open


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