Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/54222
Title: Preparation and characterization of RF sputtered oxide thin films for devices
Researcher: Jeyadheepan, K
Guide(s): Sanjeeviraja, C
Keywords: preparation and characterization
RF sputtered oxide thin films
Upload Date: 20-Oct-2015
University: Alagappa University
Completed Date: 26/03/2010
Abstract: None
Pagination: ix, 168p.
URI: http://hdl.handle.net/10603/54222
Appears in Departments:Department of Physics

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01_title.pdfAttached File253.98 kBAdobe PDFView/Open
02_declaration.pdf106.38 kBAdobe PDFView/Open
03_certificate.pdf106.5 kBAdobe PDFView/Open
04_acknowledgement.pdf116.87 kBAdobe PDFView/Open
05_abstract.pdf113.77 kBAdobe PDFView/Open
06_contents.pdf120.34 kBAdobe PDFView/Open
07_chapter 1.pdf207.71 kBAdobe PDFView/Open
08_chapter 2.pdf187.49 kBAdobe PDFView/Open
09_chapter 3.pdf257.25 kBAdobe PDFView/Open
10_chapter 4.pdf178.85 kBAdobe PDFView/Open
11_chapter 5.pdf221.76 kBAdobe PDFView/Open
12_chapter 6.pdf191.63 kBAdobe PDFView/Open
13_chapter 7.pdf244.31 kBAdobe PDFView/Open
14_chapter 8.pdf175.48 kBAdobe PDFView/Open
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