Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/534662
Title: Study of structural defects and electrical properties of crystalline silicon layer implanted with iron ions
Researcher: Thailamani, L E
Guide(s): Joshi, M C
Keywords: Crystalline Silicon
Electrical Properties
Iron Ions
Physical Sciences
Physics
Physics Applied
PKA
Structural Defects
University: University of Mumbai
Completed Date: 1981
Abstract: newlineNo newline
Pagination: xii, 195p
URI: http://hdl.handle.net/10603/534662
Appears in Departments:Department of Physics

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01_title.pdfAttached File129.48 kBAdobe PDFView/Open
02_prelim pages.pdf669.33 kBAdobe PDFView/Open
03_contents.pdf808.05 kBAdobe PDFView/Open
04_chapter 1.pdf7.09 MBAdobe PDFView/Open
05_chapter 2.pdf5.59 MBAdobe PDFView/Open
06_chapter 3.pdf6.04 MBAdobe PDFView/Open
07_chapter 4.pdf8.49 MBAdobe PDFView/Open
08_chapter 5.pdf2.8 MBAdobe PDFView/Open
80_recommendation.pdf2.93 MBAdobe PDFView/Open
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