Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/534662
Title: | Study of structural defects and electrical properties of crystalline silicon layer implanted with iron ions |
Researcher: | Thailamani, L E |
Guide(s): | Joshi, M C |
Keywords: | Crystalline Silicon Electrical Properties Iron Ions Physical Sciences Physics Physics Applied PKA Structural Defects |
University: | University of Mumbai |
Completed Date: | 1981 |
Abstract: | newlineNo newline |
Pagination: | xii, 195p |
URI: | http://hdl.handle.net/10603/534662 |
Appears in Departments: | Department of Physics |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_title.pdf | Attached File | 129.48 kB | Adobe PDF | View/Open |
02_prelim pages.pdf | 669.33 kB | Adobe PDF | View/Open | |
03_contents.pdf | 808.05 kB | Adobe PDF | View/Open | |
04_chapter 1.pdf | 7.09 MB | Adobe PDF | View/Open | |
05_chapter 2.pdf | 5.59 MB | Adobe PDF | View/Open | |
06_chapter 3.pdf | 6.04 MB | Adobe PDF | View/Open | |
07_chapter 4.pdf | 8.49 MB | Adobe PDF | View/Open | |
08_chapter 5.pdf | 2.8 MB | Adobe PDF | View/Open | |
80_recommendation.pdf | 2.93 MB | Adobe PDF | View/Open |
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