Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/518251
Title: Studies on properties of glow discharge deposited films of amorphous silicon
Researcher: Pietruszko, Stanislaw M
Guide(s): Guha, S
Keywords: Amorphous
Chalcogenide
Nitrogen
Physical Sciences
Physics
Physics Atomic Molecular and Chemical
Schottky
Semi Conductors
University: University of Mumbai
Completed Date: 1980
Abstract: newline No newline
Pagination: xiii, 152p
URI: http://hdl.handle.net/10603/518251
Appears in Departments:Department of Physics

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01_title.pdfAttached File120.78 kBAdobe PDFView/Open
02_prelim pages.pdf1.82 MBAdobe PDFView/Open
03_contents.pdf597.13 kBAdobe PDFView/Open
04_chapter 1.pdf2.19 MBAdobe PDFView/Open
05_chapter 2.pdf20.41 MBAdobe PDFView/Open
06_chapter 3.pdf5.56 MBAdobe PDFView/Open
07_chapter 4.pdf21.48 MBAdobe PDFView/Open
08_chapter 5.pdf2.02 MBAdobe PDFView/Open
80_recommendation.pdf2.16 MBAdobe PDFView/Open
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