Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/510035
Title: Electrical and IR investigations of high energy 28 Si implantation in GaAs
Researcher: Damle, Arun Ramchandra
Guide(s): Narsale, A M
Keywords: Amorphization
Annealing Technique
Dose Dependence
Ion Implantation
Physical Sciences
Physics
Physics Applied
Semiconductors
University: University of Mumbai
Completed Date: 1999
Abstract: No newline newline
Pagination: 116p
URI: http://hdl.handle.net/10603/510035
Appears in Departments:Department of Physics

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01_title.pdfAttached File145.04 kBAdobe PDFView/Open
02_prelim pages.pdf1.38 MBAdobe PDFView/Open
03_contents.pdf337.09 kBAdobe PDFView/Open
04_chapter 1.pdf1.66 MBAdobe PDFView/Open
05_chapter 2.pdf4.01 MBAdobe PDFView/Open
06_chapter 3.pdf3.72 MBAdobe PDFView/Open
07_chapter 4.pdf4.65 MBAdobe PDFView/Open
08_chapter 5.pdf1.15 MBAdobe PDFView/Open
80_recommendation.pdf1.26 MBAdobe PDFView/Open
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