Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/510035
Title: | Electrical and IR investigations of high energy 28 Si implantation in GaAs |
Researcher: | Damle, Arun Ramchandra |
Guide(s): | Narsale, A M |
Keywords: | Amorphization Annealing Technique Dose Dependence Ion Implantation Physical Sciences Physics Physics Applied Semiconductors |
University: | University of Mumbai |
Completed Date: | 1999 |
Abstract: | No newline newline |
Pagination: | 116p |
URI: | http://hdl.handle.net/10603/510035 |
Appears in Departments: | Department of Physics |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_title.pdf | Attached File | 145.04 kB | Adobe PDF | View/Open |
02_prelim pages.pdf | 1.38 MB | Adobe PDF | View/Open | |
03_contents.pdf | 337.09 kB | Adobe PDF | View/Open | |
04_chapter 1.pdf | 1.66 MB | Adobe PDF | View/Open | |
05_chapter 2.pdf | 4.01 MB | Adobe PDF | View/Open | |
06_chapter 3.pdf | 3.72 MB | Adobe PDF | View/Open | |
07_chapter 4.pdf | 4.65 MB | Adobe PDF | View/Open | |
08_chapter 5.pdf | 1.15 MB | Adobe PDF | View/Open | |
80_recommendation.pdf | 1.26 MB | Adobe PDF | View/Open |
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