1. Shodhganga@INFLIBNET
  2. University of Mumbai
  3. Department of Physics
Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/491201
Full metadata record
DC FieldValueLanguage
dc.coverage.spatial
dc.date.accessioned2023-06-13T17:43:06Z-
dc.date.available2023-06-13T17:43:06Z-
dc.identifier.urihttp://hdl.handle.net/10603/491201-
dc.description.abstractnewline No
dc.format.extent149p
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleStudy of vanadium and titanium silicide layers synthesized by high dose ion implantation on a Si films
dc.title.alternative
dc.creator.researcherKarlekar, Subhaga J
dc.subject.keywordAtomic Mixing
dc.subject.keywordEnergy Loss
dc.subject.keywordIon Implantation
dc.subject.keywordPhysical Sciences
dc.subject.keywordPhysics
dc.subject.keywordPhysics Applied
dc.subject.keywordRadiation Damage
dc.subject.keywordSputtering
dc.description.note
dc.contributor.guideRangwala, A A
dc.publisher.placeMumbai
dc.publisher.universityUniversity of Mumbai
dc.publisher.institutionDepartment of Physics
dc.date.registered
dc.date.completed1989
dc.date.awarded
dc.format.dimensions
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Physics

Files in This Item:
File Description SizeFormat 
01_title.pdfAttached File136.15 kBAdobe PDFView/Open
02_prelim pages.pdf3.75 MBAdobe PDFView/Open
03_contents.pdf567.68 kBAdobe PDFView/Open
04_chapter 1.pdf2.6 MBAdobe PDFView/Open
05_chapter 2.pdf8.27 MBAdobe PDFView/Open
06_chapter 3.pdf7.58 MBAdobe PDFView/Open
07_chapter 4.pdf4.92 MBAdobe PDFView/Open
08_chapter 5.pdf6.3 MBAdobe PDFView/Open
09_chapter 6.pdf513.8 kBAdobe PDFView/Open
10_annexures.pdf6.9 MBAdobe PDFView/Open
80_recommendation.pdf649.25 kBAdobe PDFView/Open
Show simple item record


Items in Shodhganga are licensed under Creative Commons Licence Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0).

Altmetric Badge: