Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/491201
Title: Study of vanadium and titanium silicide layers synthesized by high dose ion implantation on a Si films
Researcher: Karlekar, Subhaga J
Guide(s): Rangwala, A A
Keywords: Atomic Mixing
Energy Loss
Ion Implantation
Physical Sciences
Physics
Physics Applied
Radiation Damage
Sputtering
University: University of Mumbai
Completed Date: 1989
Abstract: newline No
Pagination: 149p
URI: http://hdl.handle.net/10603/491201
Appears in Departments:Department of Physics

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01_title.pdfAttached File136.15 kBAdobe PDFView/Open
02_prelim pages.pdf3.75 MBAdobe PDFView/Open
03_contents.pdf567.68 kBAdobe PDFView/Open
04_chapter 1.pdf2.6 MBAdobe PDFView/Open
05_chapter 2.pdf8.27 MBAdobe PDFView/Open
06_chapter 3.pdf7.58 MBAdobe PDFView/Open
07_chapter 4.pdf4.92 MBAdobe PDFView/Open
08_chapter 5.pdf6.3 MBAdobe PDFView/Open
09_chapter 6.pdf513.8 kBAdobe PDFView/Open
10_annexures.pdf6.9 MBAdobe PDFView/Open
80_recommendation.pdf649.25 kBAdobe PDFView/Open
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