Novel configurations of atomic beam and laser beam for micro and nanolithography

Abstract

Present work mainly focus on two lithographic techniques viz selective laser ablation lithography and atom lithography using dipole force The work on atom lithography using dipole is on simulation of atomic trajectories under dipoleforce using semi classical technique for various configuration of atomic beams and light fields to focus down the atomic beam at sub micron level Through these studies new configuration of light fields and atomic beams were proposed for their applications in the fi