Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/484362
Title: | Thermal ALD deposited hafnium oxide thin films for silicon surface passivation |
Researcher: | Shweta Tomer |
Guide(s): | Vandana |
Keywords: | Physical Sciences Physics Physics Applied |
University: | Academy of Scientific and Innovative Research (AcSIR) |
Completed Date: | 2022 |
Abstract: | newline |
Pagination: | All Pages |
URI: | http://hdl.handle.net/10603/484362 |
Appears in Departments: | Physical Sciences (CSIR-NPL) |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_title.pdf | Attached File | 79.65 kB | Adobe PDF | View/Open |
02_prelim pages.pdf | 4.03 MB | Adobe PDF | View/Open | |
03_content.pdf | 384.91 kB | Adobe PDF | View/Open | |
04_abstract.pdf | 9.48 kB | Adobe PDF | View/Open | |
05_chapter 1.pdf | 851.34 kB | Adobe PDF | View/Open | |
06_chapter 2.pdf | 1.13 MB | Adobe PDF | View/Open | |
07_chapter 3.pdf | 606.37 kB | Adobe PDF | View/Open | |
08_chapter 4.pdf | 735.98 kB | Adobe PDF | View/Open | |
09_chapter 5.pdf | 614.7 kB | Adobe PDF | View/Open | |
10_annexure.pdf | 2.86 MB | Adobe PDF | View/Open | |
80_recommendation.pdf | 163.31 kB | Adobe PDF | View/Open |
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