Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/484362
Title: Thermal ALD deposited hafnium oxide thin films for silicon surface passivation
Researcher: Shweta Tomer
Guide(s): Vandana
Keywords: Physical Sciences
Physics
Physics Applied
University: Academy of Scientific and Innovative Research (AcSIR)
Completed Date: 2022
Abstract: newline
Pagination: All Pages
URI: http://hdl.handle.net/10603/484362
Appears in Departments:Physical Sciences (CSIR-NPL)

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01_title.pdfAttached File79.65 kBAdobe PDFView/Open
02_prelim pages.pdf4.03 MBAdobe PDFView/Open
03_content.pdf384.91 kBAdobe PDFView/Open
04_abstract.pdf9.48 kBAdobe PDFView/Open
05_chapter 1.pdf851.34 kBAdobe PDFView/Open
06_chapter 2.pdf1.13 MBAdobe PDFView/Open
07_chapter 3.pdf606.37 kBAdobe PDFView/Open
08_chapter 4.pdf735.98 kBAdobe PDFView/Open
09_chapter 5.pdf614.7 kBAdobe PDFView/Open
10_annexure.pdf2.86 MBAdobe PDFView/Open
80_recommendation.pdf163.31 kBAdobe PDFView/Open
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