1. Shodhganga@INFLIBNET
  2. University of Calcutta
  3. Department of Applied Physics
Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/483188
Title: Growth Characterization and Optimization of Doped Nanocrystalline Silicon Thin Film by Plasma CVD for Device Applications
Researcher: Patra, Chandralina
Guide(s): Das, Debajyoti
Keywords: Physical Sciences
Physics
Physics Multidisciplinary
University: University of Calcutta
Completed Date: 2023
Abstract: Abstract available
Pagination: xvii, 221
URI: http://hdl.handle.net/10603/483188
Appears in Departments:Department of Applied Physics

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01_title.pdfAttached File161 kBAdobe PDFView/Open
02_prelim pages.pdf3.27 MBAdobe PDFView/Open
03_content.pdf799.22 kBAdobe PDFView/Open
04_abstract.pdf138.2 kBAdobe PDFView/Open
05_chapter 1.pdf1.89 MBAdobe PDFView/Open
06_chapter 2.pdf896.47 kBAdobe PDFView/Open
07_chapter 3.pdf1.51 MBAdobe PDFView/Open
08_chapter 4.pdf1.84 MBAdobe PDFView/Open
09_chapter 5.pdf1.97 MBAdobe PDFView/Open
10_chapter 6.pdf1.89 MBAdobe PDFView/Open
11_chapter 7.pdf2.35 MBAdobe PDFView/Open
12_chapter 8.pdf1.68 MBAdobe PDFView/Open
13_chapter 9.pdf3.33 MBAdobe PDFView/Open
14_chapter 10.pdf698.25 kBAdobe PDFView/Open
80_recommendation.pdf161 kBAdobe PDFView/Open
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