Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/482035
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dc.coverage.spatialDepartment of Electrical Engineering
dc.date.accessioned2023-05-10T05:12:01Z-
dc.date.available2023-05-10T05:12:01Z-
dc.identifier.urihttp://hdl.handle.net/10603/482035-
dc.description.abstractAbstract attached newline newline
dc.format.extentNA
dc.languageEnglish
dc.relationNA
dc.rightsuniversity
dc.titlePulsed DC reactive sputtered aluminum oxide for the surface passivation of crystalline silicon solar cell
dc.title.alternativeNa
dc.creator.researcherBhaisare, Meenakshi
dc.subject.keywordEngineering
dc.subject.keywordEngineering and Technology
dc.subject.keywordEngineering Electrical and Electronic
dc.description.noteNA
dc.contributor.guideKottanthaaryli, Anil
dc.publisher.placeMumbai
dc.publisher.universityIndian Institute of Technology Bombay
dc.publisher.institutionDepartment of Electrical Engineering
dc.date.registered2007
dc.date.completed2019
dc.date.awarded2019
dc.format.dimensionsNA
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Electrical Engineering

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01_title.pdfAttached File372.45 kBAdobe PDFView/Open
02_prelimpages.pdf546.84 kBAdobe PDFView/Open
03_abstract.pdf861.04 kBAdobe PDFView/Open
04_contents.pdf2.13 MBAdobe PDFView/Open
05_chapter_1.pdf931.31 kBAdobe PDFView/Open
06_chapter_2.pdf1.46 MBAdobe PDFView/Open
07_chapter_3.pdf1.22 MBAdobe PDFView/Open
08_chapter_4.pdf886.59 kBAdobe PDFView/Open
09_chapter_5.pdf1.27 MBAdobe PDFView/Open
10_chapter_6.pdf996.2 kBAdobe PDFView/Open
11_chapter_7.pdf731.32 kBAdobe PDFView/Open
12_annexure.pdf1.09 MBAdobe PDFView/Open
80_recommendation.pdf644.91 kBAdobe PDFView/Open


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