Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/473278
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dc.coverage.spatialPhysics
dc.date.accessioned2023-03-28T11:51:26Z-
dc.date.available2023-03-28T11:51:26Z-
dc.identifier.urihttp://hdl.handle.net/10603/473278-
dc.description.abstractThe present research work was aimed towards the fabrication and characterization of nc Si SiOx and SiC films via PLD technique The effect of substrate temperature and background gas pressure on their stoichiometry crystallinity linear as well as nonlinear optical NLO and photoluminescence PL properties of these films are studied in detail The PLD nc Si thin films were comprised of nc Si domains embedded in a Si matrix The crystallinity as well as optical properties were observed to be i
dc.format.extentNot Available
dc.languageEnglish
dc.relationNot Available
dc.rightsself
dc.titleStudies on linear and non linear optical properties of pulsed laser deposited si siox and sic nanostructured thin films
dc.title.alternativeNot available
dc.creator.researcherDey, Partha Pratim
dc.subject.keywordPhysical Sciences
dc.subject.keywordPhysics
dc.subject.keywordPhysics Applied
dc.description.noteNot Available
dc.contributor.guideKhare, Alika
dc.publisher.placeGuwahati
dc.publisher.universityIndian Institute of Technology Guwahati
dc.publisher.institutionDEPARTMENT OF PHYSICS
dc.date.registered2010
dc.date.completed2018
dc.date.awarded2018
dc.format.dimensionsNot Available
dc.format.accompanyingmaterialNone
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:DEPARTMENT OF PHYSICS

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