Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/463173
Title: GaN based mis hemts with gate dielectrics grown by high pressure oxidation
Researcher: Kanaga, Srikanth
Guide(s): Dasgupta, Amitava
Keywords: Engineering
Engineering and Technology
Engineering Electrical and Electronic
University: Indian Institute of Technology Madras
Completed Date: 2022
Abstract: newline
Pagination: xxiii, 148p.
URI: http://hdl.handle.net/10603/463173
Appears in Departments:Electrical Engineering

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01_title.pdfAttached File259.92 kBAdobe PDFView/Open
02_prelim pages.pdf795.25 kBAdobe PDFView/Open
03_content.pdf449.89 kBAdobe PDFView/Open
04_abstract.pdf26.77 kBAdobe PDFView/Open
05_chapter 1.pdf529.82 kBAdobe PDFView/Open
06_chapter 2.pdf619.71 kBAdobe PDFView/Open
07_chapter 3.pdf2.12 MBAdobe PDFView/Open
08_chapter 4.pdf2.41 MBAdobe PDFView/Open
09_chapter 5.pdf1.44 MBAdobe PDFView/Open
10_annexure.pdf371.28 kBAdobe PDFView/Open
11_chapter 6.pdf310.89 kBAdobe PDFView/Open
80_recommendation.pdf310.89 kBAdobe PDFView/Open
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