Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/436710
Title: | Investigation of electrical properties of zro2 and hfo2 high k dielectric thin films in mos capacitors |
Researcher: | Udaya Bhanu, J |
Guide(s): | Thangadurai, P |
Keywords: | Physical Sciences Multidisciplinary Nanoscience and Nanotechnology complementary metal oxide semiconductor microelectronic memory MOS capacitors |
University: | Pondicherry University |
Completed Date: | 2019 |
Abstract: | newline |
Pagination: | 159p. |
URI: | http://hdl.handle.net/10603/436710 |
Appears in Departments: | Centre for Nano Sciences & Technology |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_tilte.pdf | Attached File | 114.43 kB | Adobe PDF | View/Open |
02_ prelim pages.pdf | 482.46 kB | Adobe PDF | View/Open | |
03_content.pdf | 33.17 kB | Adobe PDF | View/Open | |
04_ preface.pdf | 37.05 kB | Adobe PDF | View/Open | |
05_ chapter 1.pdf | 844.29 kB | Adobe PDF | View/Open | |
06_ chapter 2.pdf | 1.68 MB | Adobe PDF | View/Open | |
07_ chapter 3.pdf | 2.11 MB | Adobe PDF | View/Open | |
08_ chapter 4.pdf | 1.93 MB | Adobe PDF | View/Open | |
09_ chapter 5.pdf | 1.65 MB | Adobe PDF | View/Open | |
10_ chapter 6.pdf | 1.81 MB | Adobe PDF | View/Open | |
11_ chapter 7.pdf | 187.65 kB | Adobe PDF | View/Open | |
12_annexures.pdf | 94.34 kB | Adobe PDF | View/Open | |
80_recommendation.pdf | 302.29 kB | Adobe PDF | View/Open |
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