Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/436710
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dc.coverage.spatial
dc.date.accessioned2023-01-05T04:25:10Z-
dc.date.available2023-01-05T04:25:10Z-
dc.identifier.urihttp://hdl.handle.net/10603/436710-
dc.description.abstractnewline
dc.format.extent159p.
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleInvestigation of electrical properties of zro2 and hfo2 high k dielectric thin films in mos capacitors
dc.title.alternative
dc.creator.researcherUdaya Bhanu, J
dc.subject.keywordPhysical Sciences
dc.subject.keywordMultidisciplinary
dc.subject.keywordNanoscience and Nanotechnology
dc.subject.keywordcomplementary metal oxide semiconductor
dc.subject.keywordmicroelectronic memory
dc.subject.keywordMOS capacitors
dc.description.note
dc.contributor.guideThangadurai, P
dc.publisher.placePondicherry
dc.publisher.universityPondicherry University
dc.publisher.institutionCentre for Nano Sciences and Technology
dc.date.registered
dc.date.completed2019
dc.date.awarded2020
dc.format.dimensions
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Centre for Nano Sciences & Technology

Files in This Item:
File Description SizeFormat 
01_tilte.pdfAttached File114.43 kBAdobe PDFView/Open
02_ prelim pages.pdf482.46 kBAdobe PDFView/Open
03_content.pdf33.17 kBAdobe PDFView/Open
04_ preface.pdf37.05 kBAdobe PDFView/Open
05_ chapter 1.pdf844.29 kBAdobe PDFView/Open
06_ chapter 2.pdf1.68 MBAdobe PDFView/Open
07_ chapter 3.pdf2.11 MBAdobe PDFView/Open
08_ chapter 4.pdf1.93 MBAdobe PDFView/Open
09_ chapter 5.pdf1.65 MBAdobe PDFView/Open
10_ chapter 6.pdf1.81 MBAdobe PDFView/Open
11_ chapter 7.pdf187.65 kBAdobe PDFView/Open
12_annexures.pdf94.34 kBAdobe PDFView/Open
80_recommendation.pdf302.29 kBAdobe PDFView/Open


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