Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/436710
Title: Investigation of electrical properties of zro2 and hfo2 high k dielectric thin films in mos capacitors
Researcher: Udaya Bhanu, J
Guide(s): Thangadurai, P
Keywords: Physical Sciences
Multidisciplinary
Nanoscience and Nanotechnology
complementary metal oxide semiconductor
microelectronic memory
MOS capacitors
University: Pondicherry University
Completed Date: 2019
Abstract: newline
Pagination: 159p.
URI: http://hdl.handle.net/10603/436710
Appears in Departments:Centre for Nano Sciences & Technology

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01_tilte.pdfAttached File114.43 kBAdobe PDFView/Open
02_ prelim pages.pdf482.46 kBAdobe PDFView/Open
03_content.pdf33.17 kBAdobe PDFView/Open
04_ preface.pdf37.05 kBAdobe PDFView/Open
05_ chapter 1.pdf844.29 kBAdobe PDFView/Open
06_ chapter 2.pdf1.68 MBAdobe PDFView/Open
07_ chapter 3.pdf2.11 MBAdobe PDFView/Open
08_ chapter 4.pdf1.93 MBAdobe PDFView/Open
09_ chapter 5.pdf1.65 MBAdobe PDFView/Open
10_ chapter 6.pdf1.81 MBAdobe PDFView/Open
11_ chapter 7.pdf187.65 kBAdobe PDFView/Open
12_annexures.pdf94.34 kBAdobe PDFView/Open
80_recommendation.pdf302.29 kBAdobe PDFView/Open
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