Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/428653
Title: Exploration of New Materials and Processes for Ion Sensitive Field Effect Transistors
Researcher: Dawnee, S
Guide(s): Bhat, Navakanta
Keywords: Engineering
Engineering and Technology
Engineering Electrical and Electronic
University: Indian Institute of Science Bangalore
Completed Date: 2020
Abstract: Ion Sensitive Field Effect Transistors (ISFETs) find applications as front end transducers in the biomedical domain as a biosensor. The favourable characteristics of ISFETs like sensitivity, speed, miniaturization, easy integration, high reliability, low cost and precise process control make ISFETs a promising candidate for the same. However, future applications in the bio medical field require bio sensors with faster response time, which are stable and bio compatible such that it can be used for both in vitro and in vivo applications. For ISFET based technology to drive the biosensor market, it should have excellent sensitivity to pH. Even though the concept of ISFETs as a tool for electrophysiology was first introduced in the 1970and#8223;s its practical applications fell behind over the years as the pH sensitivity of classical ISFETs were limited by the Nernst limit of 59mV/pH. This work aims at the exploration of new materials and processes for ISFETs to enhance their pH sensitivity. Engineering the sensory surface, engineering the structural dimensions, reducing the screening of counter ion charge, electromechanical coupling techniques etc. are some of the methods suggested in literature to improve the pH sensitivity of ISFETs. In the quest to engineering the sensory surface, the possibility of improving sensitivity by various gate dielectrics was evaluated first. A process flow for fabrication of ISFETs was developed and optimised for experimental studies. First, ISFETs with classical SiO2 as dielectric, were fabricated using the optimised process flow with additional post fabrication modification of acrylic well to contain the electrolyte. Encapsulation which is a challenge in ISFET technology was addressed with SU-8 encapsulation on the fabricated devices. A platinum electrode just touching the electrolyte was used to apply gate bias. The pH response of the fabricated devices was studied and was found to adhere to classical ISFET nature. To study the effect of dielectrics on pH response of ISFETs, a comparative..
Pagination: xiii, 128p.
URI: http://hdl.handle.net/10603/428653
Appears in Departments:Centre for Nano Science and Engineering

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01_title.pdfAttached File310.64 kBAdobe PDFView/Open
02_prelim pages.pdf261.92 kBAdobe PDFView/Open
03_table of contents.pdf198.51 kBAdobe PDFView/Open
04_abstract.pdf171.77 kBAdobe PDFView/Open
05_chapter 1.pdf820.48 kBAdobe PDFView/Open
06_chapter 2.pdf440.18 kBAdobe PDFView/Open
07_chapter 3.pdf1.16 MBAdobe PDFView/Open
08_chapter 4.pdf1.11 MBAdobe PDFView/Open
09_chapter 5.pdf788.26 kBAdobe PDFView/Open
10_chapter 6.pdf1.07 MBAdobe PDFView/Open
11_annexure.pdf501.06 kBAdobe PDFView/Open
80_recommendation.pdf577.18 kBAdobe PDFView/Open
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