Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/425762
Title: | Plasma based passivation study for algan gan hemt using plasma enhanced chemical vapor deposition pecvd and inductively coupled plasma chemical vapor deposition icpcvd techniques |
Researcher: | Sunil Kumar |
Guide(s): | Malik, Hitendra K. |
Keywords: | Physical Sciences Physics Physics Fluids and Plasmas |
University: | Indian Institute of Technology Delhi |
Completed Date: | 2020 |
Abstract: | Abstract Available |
Pagination: | |
URI: | http://hdl.handle.net/10603/425762 |
Appears in Departments: | Department of Physics |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_title.pdf | Attached File | 100.91 kB | Adobe PDF | View/Open |
02_prelim pages.pdf | 370.23 kB | Adobe PDF | View/Open | |
03_content.pdf | 104.66 kB | Adobe PDF | View/Open | |
04_abstract.pdf | 155.12 kB | Adobe PDF | View/Open | |
05_chapter 1.pdf | 755.57 kB | Adobe PDF | View/Open | |
06_chapter 2.pdf | 7.41 MB | Adobe PDF | View/Open | |
07_chapter 3.pdf | 1.62 MB | Adobe PDF | View/Open | |
08_chapter 4.pdf | 9.51 MB | Adobe PDF | View/Open | |
09_chapter 5.pdf | 867.13 kB | Adobe PDF | View/Open | |
10_chapter 6.pdf | 131.73 kB | Adobe PDF | View/Open | |
11_annexures.pdf | 125.16 kB | Adobe PDF | View/Open | |
80_recommendation.pdf | 208.21 kB | Adobe PDF | View/Open |
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