Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/425762
Title: Plasma based passivation study for algan gan hemt using plasma enhanced chemical vapor deposition pecvd and inductively coupled plasma chemical vapor deposition icpcvd techniques
Researcher: Sunil Kumar
Guide(s): Malik, Hitendra K.
Keywords: Physical Sciences
Physics
Physics Fluids and Plasmas
University: Indian Institute of Technology Delhi
Completed Date: 2020
Abstract: Abstract Available
Pagination: 
URI: http://hdl.handle.net/10603/425762
Appears in Departments:Department of Physics

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01_title.pdfAttached File100.91 kBAdobe PDFView/Open
02_prelim pages.pdf370.23 kBAdobe PDFView/Open
03_content.pdf104.66 kBAdobe PDFView/Open
04_abstract.pdf155.12 kBAdobe PDFView/Open
05_chapter 1.pdf755.57 kBAdobe PDFView/Open
06_chapter 2.pdf7.41 MBAdobe PDFView/Open
07_chapter 3.pdf1.62 MBAdobe PDFView/Open
08_chapter 4.pdf9.51 MBAdobe PDFView/Open
09_chapter 5.pdf867.13 kBAdobe PDFView/Open
10_chapter 6.pdf131.73 kBAdobe PDFView/Open
11_annexures.pdf125.16 kBAdobe PDFView/Open
80_recommendation.pdf208.21 kBAdobe PDFView/Open
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