Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/419390
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dc.coverage.spatial
dc.date.accessioned2022-11-16T09:08:52Z-
dc.date.available2022-11-16T09:08:52Z-
dc.identifier.urihttp://hdl.handle.net/10603/419390-
dc.description.abstractFabrication and Characterization of Pt/HfO2/SiON/Si structure employing metal floating gate for non volatile memory applications newline
dc.format.extent
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleFabrication and Characterization of Pt HfO2 SiON Si structure employing metal floating gate for non volatile memory applications
dc.title.alternativeFabrication and Characterization of Pt/HfO2/SiON/Si structure employing metal floating gate for non volatile memory applications
dc.creator.researcherRenu
dc.subject.keywordPhysical Sciences
dc.subject.keywordMultidisciplinary
dc.subject.keywordMultidisciplinary Sciences
dc.description.note
dc.contributor.guideVaid, Rakesh
dc.publisher.placeJammu and Kashmir
dc.publisher.universityUniversity of Jammu
dc.publisher.institutionDepartment of Physics and Electronics
dc.date.registered2013
dc.date.completed2021
dc.date.awarded2021
dc.format.dimensions
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Physics & Electronics

Files in This Item:
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01_title.pdfAttached File107.52 kBAdobe PDFView/Open
02_prelim pages.pdf972.04 kBAdobe PDFView/Open
03_contents.pdf43.04 kBAdobe PDFView/Open
04_chapter 1.pdf749.99 kBAdobe PDFView/Open
05_chapter 2.pdf473.5 kBAdobe PDFView/Open
06_chapter 3.pdf1.51 MBAdobe PDFView/Open
07_chapter 4.pdf1.21 MBAdobe PDFView/Open
08_chapter 5.pdf178.75 kBAdobe PDFView/Open
09_annexures.pdf164.28 kBAdobe PDFView/Open
80_recommendation.pdf282.11 kBAdobe PDFView/Open


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