Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/419390
Title: | Fabrication and Characterization of Pt HfO2 SiON Si structure employing metal floating gate for non volatile memory applications |
Researcher: | Renu |
Guide(s): | Vaid, Rakesh |
Keywords: | Physical Sciences Multidisciplinary Multidisciplinary Sciences |
University: | University of Jammu |
Completed Date: | 2021 |
Abstract: | Fabrication and Characterization of Pt/HfO2/SiON/Si structure employing metal floating gate for non volatile memory applications newline |
Pagination: | |
URI: | http://hdl.handle.net/10603/419390 |
Appears in Departments: | Department of Physics & Electronics |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
01_title.pdf | Attached File | 107.52 kB | Adobe PDF | View/Open |
02_prelim pages.pdf | 972.04 kB | Adobe PDF | View/Open | |
03_contents.pdf | 43.04 kB | Adobe PDF | View/Open | |
04_chapter 1.pdf | 749.99 kB | Adobe PDF | View/Open | |
05_chapter 2.pdf | 473.5 kB | Adobe PDF | View/Open | |
06_chapter 3.pdf | 1.51 MB | Adobe PDF | View/Open | |
07_chapter 4.pdf | 1.21 MB | Adobe PDF | View/Open | |
08_chapter 5.pdf | 178.75 kB | Adobe PDF | View/Open | |
09_annexures.pdf | 164.28 kB | Adobe PDF | View/Open | |
80_recommendation.pdf | 282.11 kB | Adobe PDF | View/Open |
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