Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/355451
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dc.date.accessioned2022-01-12T06:10:19Z-
dc.date.available2022-01-12T06:10:19Z-
dc.identifier.urihttp://hdl.handle.net/10603/355451-
dc.description.abstractIn this research work aluminum nitride (AlN) films were deposited using only RF reactive sputtering atmosphere of nitrogen and argon on mild steel (AISI 1018). Coatings were deposited on substrates at RT, 200ºC, 400ºC, 500ºC and 600ºC.The substrate temperature notably affected the thickness, crystalline grain size, and hardness of the coatings. To check the chemical composition, thickness, roughness, film structure, mechanical and corrosion properties of the film XRD, AFM, SEM, EDX, Nano indentation, salt spray or moisture to used. All samples showed excessive hardness values in some cases, 23 Gpa and Elastic modulus 222 Gpa at 500ºC. AlN with a lattice (a=2.80710 and#506;) parameter was developed under the conditions of high surface mobility. newlineTwo series of Al-Cu-N films containing Cu were grown by DC / RF magnetron sputtering of two elemental targets in an Ar / N and sub2; Gas mixture was deposited by biasing a high-speed steel substrate. The effect of Cu content and deposition conditions were investigated with respect to the microstructure, morphology and mechanical properties of the films. The structure and mechanical properties of these films was dependent on the copper concentration. X-ray diffraction analysis and high-resolution and standard transmission microscopy analyzes show that the particle size in the film decreases with increasing copper content, but the sign of the copper-cutting content has not been determined. The micro hardness and adhesion of the coating/substrate was analyzed with a micro hardness tester and a scratch test. newlineThe properties of Tantalum nitrate (TaN) multilayer covering by DC Magnetron Sputtering at different testimony temperatures (2000C and 4000C) were proposed in the examination. The TaN multilayer coating was stored sequentially with the layers at base weight 3.7x10-6 m.bar, working weight 11.5x10-3 m.bar, Ar:N stream rate 15:28 SCCM 100w by DC magnetron sputtering. The impact of the microstructure of layer thickness was explored. Higher hardness was found, 200oC covering around 180
dc.format.extent
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleMetal Ceramic Nano Composite Coatings by RF DC Magnetron Sputtering and Characterization
dc.title.alternative
dc.creator.researcherHariharan, R
dc.subject.keywordEngineering
dc.subject.keywordEngineering and Technology
dc.subject.keywordEngineering Mechanical
dc.description.note
dc.contributor.guideRaja, R
dc.publisher.placeChennai
dc.publisher.universityBharath University
dc.publisher.institutionDepartment of Mechanical Engineering
dc.date.registered
dc.date.completed2021
dc.date.awarded
dc.format.dimensions
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Computer Application

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80_recommendation.pdfAttached File618.17 kBAdobe PDFView/Open
cert.pdf318.64 kBAdobe PDFView/Open
chapter 1.pdf1.27 MBAdobe PDFView/Open
chapter 2.pdf442.03 kBAdobe PDFView/Open
chapter 3.pdf1.4 MBAdobe PDFView/Open
chapter 4.pdf3.85 MBAdobe PDFView/Open
chapter 5.pdf289.39 kBAdobe PDFView/Open
chapter 6.pdf152.07 kBAdobe PDFView/Open
chapter 7.pdf147.8 kBAdobe PDFView/Open
preliminary pages.pdf1.09 MBAdobe PDFView/Open
title.pdf32.53 kBAdobe PDFView/Open


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