A Study on the integration issues of high k gate dielectrics on hetero epilayers for advanced nano scale MOS devices

Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/314176

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DC Field	Value	Language
dc.coverage.spatial
dc.date.accessioned	2021-02-03T11:11:10Z	-
dc.date.available	2021-02-03T11:11:10Z	-
dc.identifier.uri	http://hdl.handle.net/10603/314176	-
dc.description.abstract	Abstract available
dc.format.extent	149p
dc.language	English
dc.relation	121-149
dc.rights	university
dc.title	A Study on the integration issues of high k gate dielectrics on hetero epilayers for advanced nano scale MOS devices
dc.title.alternative
dc.creator.researcher	Das, Anindita
dc.subject.keyword	Physical Sciences
dc.subject.keyword	Multidisciplinary
dc.subject.keyword	Nanoscience and Nanotechnology
dc.description.note
dc.contributor.guide	Chattopadhyay, Sanatan
dc.publisher.place	Kolkata
dc.publisher.university	University of Calcutta
dc.publisher.institution	Department of Nanoscience and Nanotechnology
dc.date.registered
dc.date.completed	2018
dc.date.awarded
dc.format.dimensions
dc.format.accompanyingmaterial	DVD
dc.source.university	University
dc.type.degree	Ph.D.
Appears in Departments:	Department of Nanoscience and Nanotechnology

Files in This Item:

File	Description	Size	Format
01_title page.pdf	Attached File	79.58 kB	Adobe PDF	View/Open
02_abstract.pdf		90.29 kB	Adobe PDF	View/Open
03_acknowledgement.pdf		79.53 kB	Adobe PDF	View/Open
04_content.pdf		303.32 kB	Adobe PDF	View/Open
05_list of publication.pdf		80.2 kB	Adobe PDF	View/Open
06_chapter 1.pdf		299.28 kB	Adobe PDF	View/Open
07_chapter 2.pdf		579.44 kB	Adobe PDF	View/Open
08_chapter 3.pdf		2.12 MB	Adobe PDF	View/Open
09_chapter 4.pdf		2.98 MB	Adobe PDF	View/Open
10_chapter 5.pdf		2.16 MB	Adobe PDF	View/Open
11_chapter 6.pdf		581.43 kB	Adobe PDF	View/Open
12_chapter 7.pdf		139.79 kB	Adobe PDF	View/Open
13_references.pdf		296.02 kB	Adobe PDF	View/Open
80_recommendation.pdf		79.58 kB	Adobe PDF	View/Open