Please use this identifier to cite or link to this item:
http://hdl.handle.net/10603/282006
Title: | Vapour pressure of volatile precursor complexes of nickel and titanium for coating Tio2 Ni TiO2 and Ni TiN thin films by pamocvd process |
Researcher: | Arockiasamy S |
Guide(s): | Nagaraja K S |
University: | University of Madras |
Completed Date: | |
Abstract: | Vapour pressure of volatile precursor complexes of nickel and titanium for coating Tio2 Ni/TiO2 and Ni/TiN thin films by pamocvd process newline |
Pagination: | |
URI: | http://hdl.handle.net/10603/282006 |
Appears in Departments: | Department of Chemistry |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
5915 01 title.pdf | Attached File | 271.69 kB | Adobe PDF | View/Open |
5915 02 certificate.pdf | 281.81 kB | Adobe PDF | View/Open | |
5915 03 preliminary pages.pdf | 8.64 MB | Adobe PDF | View/Open | |
5915 04 chapter 1.pdf | 15.51 MB | Adobe PDF | View/Open | |
5915 05 chapter 2.pdf | 8.74 MB | Adobe PDF | View/Open | |
5915 06 chapter 3.pdf | 37.83 MB | Adobe PDF | View/Open | |
5915 07 chapter 4.pdf | 12.93 MB | Adobe PDF | View/Open | |
5915 08 chapter 5.pdf | 13.24 MB | Adobe PDF | View/Open | |
5915 09 chapter 6.pdf | 2.97 MB | Adobe PDF | View/Open |
Items in Shodhganga are licensed under Creative Commons Licence Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0).
Altmetric Badge: