1. Shodhganga@INFLIBNET
  2. University of Madras
  3. Department of Chemistry
Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/282006
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DC FieldValueLanguage
dc.coverage.spatialChemistry
dc.date.accessioned2020-03-16T09:28:43Z-
dc.date.available2020-03-16T09:28:43Z-
dc.identifier.urihttp://hdl.handle.net/10603/282006-
dc.description.abstractVapour pressure of volatile precursor complexes of nickel and titanium for coating Tio2 Ni/TiO2 and Ni/TiN thin films by pamocvd process newline
dc.format.extent
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleVapour pressure of volatile precursor complexes of nickel and titanium for coating Tio2 Ni TiO2 and Ni TiN thin films by pamocvd process
dc.title.alternative
dc.creator.researcherArockiasamy S
dc.description.note
dc.contributor.guideNagaraja K S
dc.publisher.placeChennai
dc.publisher.universityUniversity of Madras
dc.publisher.institutionDepartment of Chemistry
dc.date.registered
dc.date.completed
dc.date.awarded
dc.format.dimensions
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Chemistry

Files in This Item:
File Description SizeFormat 
5915 01 title.pdfAttached File271.69 kBAdobe PDFView/Open
5915 02 certificate.pdf281.81 kBAdobe PDFView/Open
5915 03 preliminary pages.pdf8.64 MBAdobe PDFView/Open
5915 04 chapter 1.pdf15.51 MBAdobe PDFView/Open
5915 05 chapter 2.pdf8.74 MBAdobe PDFView/Open
5915 06 chapter 3.pdf37.83 MBAdobe PDFView/Open
5915 07 chapter 4.pdf12.93 MBAdobe PDFView/Open
5915 08 chapter 5.pdf13.24 MBAdobe PDFView/Open
5915 09 chapter 6.pdf2.97 MBAdobe PDFView/Open
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