Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/282006
Title: Vapour pressure of volatile precursor complexes of nickel and titanium for coating Tio2 Ni TiO2 and Ni TiN thin films by pamocvd process
Researcher: Arockiasamy S
Guide(s): Nagaraja K S
University: University of Madras
Completed Date: 
Abstract: Vapour pressure of volatile precursor complexes of nickel and titanium for coating Tio2 Ni/TiO2 and Ni/TiN thin films by pamocvd process newline
Pagination: 
URI: http://hdl.handle.net/10603/282006
Appears in Departments:Department of Chemistry

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5915 01 title.pdfAttached File271.69 kBAdobe PDFView/Open
5915 02 certificate.pdf281.81 kBAdobe PDFView/Open
5915 03 preliminary pages.pdf8.64 MBAdobe PDFView/Open
5915 04 chapter 1.pdf15.51 MBAdobe PDFView/Open
5915 05 chapter 2.pdf8.74 MBAdobe PDFView/Open
5915 06 chapter 3.pdf37.83 MBAdobe PDFView/Open
5915 07 chapter 4.pdf12.93 MBAdobe PDFView/Open
5915 08 chapter 5.pdf13.24 MBAdobe PDFView/Open
5915 09 chapter 6.pdf2.97 MBAdobe PDFView/Open
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