Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/264929
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DC FieldValueLanguage
dc.coverage.spatial
dc.date.accessioned2019-12-27T05:06:49Z-
dc.date.available2019-12-27T05:06:49Z-
dc.identifier.urihttp://hdl.handle.net/10603/264929-
dc.description.abstractThe complete abstract is available in the abstract Par newline
dc.format.extentI-XVI,1-115
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleStudy of Process Parameters Variation and Self Heating Effect on Inverted T Field Effect Transistors
dc.title.alternative
dc.creator.researcherRajeev Pankaj Nelapati
dc.subject.keywordEngineering and Technology,Engineering,Engineering Electrical and Electronic
dc.description.note
dc.contributor.guideSivasankaran.K
dc.publisher.placeVellore
dc.publisher.universityVIT University
dc.publisher.institutionSchool of Electronic Engineering
dc.date.registered19/02/2012
dc.date.completed2019
dc.date.awarded17/09/2019
dc.format.dimensions
dc.format.accompanyingmaterialNone
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:School of Electronic Engineering

Files in This Item:
File Description SizeFormat 
01_title.pdfAttached File127.87 kBAdobe PDFView/Open
02_dcl,certificate.pdf594.73 kBAdobe PDFView/Open
03_abstract.pdf106.58 kBAdobe PDFView/Open
04_contents.pdf94.63 kBAdobe PDFView/Open
05_list of tables.pdf86.92 kBAdobe PDFView/Open
06_list of figures.pdf167.5 kBAdobe PDFView/Open
07_acknowledgement.pdf41.38 kBAdobe PDFView/Open
08_chapter-1.pdf2.79 MBAdobe PDFView/Open
09_chapter 2.pdf36.73 MBAdobe PDFView/Open
10_chapter-3.pdf5.51 MBAdobe PDFView/Open
11_chapter-4.pdf4.21 MBAdobe PDFView/Open
12_chapter-5.pdf2.51 MBAdobe PDFView/Open
13_chapter-6.pdf28.02 MBAdobe PDFView/Open
14_conclusion.pdf111.04 kBAdobe PDFView/Open
15_references.pdf148.97 kBAdobe PDFView/Open
16_list of publications.pdf55.95 kBAdobe PDFView/Open


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