Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/264929
Title: Study of Process Parameters Variation and Self Heating Effect on Inverted T Field Effect Transistors
Researcher: Rajeev Pankaj Nelapati
Guide(s): Sivasankaran.K
Keywords: Engineering and Technology,Engineering,Engineering Electrical and Electronic
University: VIT University
Completed Date: 2019
Abstract: The complete abstract is available in the abstract Par newline
Pagination: I-XVI,1-115
URI: http://hdl.handle.net/10603/264929
Appears in Departments:School of Electronic Engineering

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01_title.pdfAttached File127.87 kBAdobe PDFView/Open
02_dcl,certificate.pdf594.73 kBAdobe PDFView/Open
03_abstract.pdf106.58 kBAdobe PDFView/Open
04_contents.pdf94.63 kBAdobe PDFView/Open
05_list of tables.pdf86.92 kBAdobe PDFView/Open
06_list of figures.pdf167.5 kBAdobe PDFView/Open
07_acknowledgement.pdf41.38 kBAdobe PDFView/Open
08_chapter-1.pdf2.79 MBAdobe PDFView/Open
09_chapter 2.pdf36.73 MBAdobe PDFView/Open
10_chapter-3.pdf5.51 MBAdobe PDFView/Open
11_chapter-4.pdf4.21 MBAdobe PDFView/Open
12_chapter-5.pdf2.51 MBAdobe PDFView/Open
13_chapter-6.pdf28.02 MBAdobe PDFView/Open
14_conclusion.pdf111.04 kBAdobe PDFView/Open
15_references.pdf148.97 kBAdobe PDFView/Open
16_list of publications.pdf55.95 kBAdobe PDFView/Open
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