Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/210390
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DC FieldValueLanguage
dc.coverage.spatial
dc.date.accessioned2018-08-01T11:49:10Z-
dc.date.available2018-08-01T11:49:10Z-
dc.identifier.urihttp://hdl.handle.net/10603/210390-
dc.description.abstractnewline
dc.format.extent258
dc.languageEnglish
dc.relation
dc.rightsuniversity
dc.titleDeposition Characterization and theoretical analysis of industrially important In2o3 and TiO2 Thin films
dc.title.alternative
dc.creator.researcherJoseph Panneerdoss I.
dc.description.note
dc.contributor.guideJohnson Jeyakumar S.
dc.publisher.placeTiruchirappalli
dc.publisher.universityBharathidasan University
dc.publisher.institutionDepartment of Physics
dc.date.registered2013
dc.date.completed2014
dc.date.awarded
dc.format.dimensions
dc.format.accompanyingmaterialDVD
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Physics

Files in This Item:
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01 front page.pdfAttached File217.06 kBAdobe PDFView/Open
02 certificate.pdf236.98 kBAdobe PDFView/Open
03 declaration.pdf183.19 kBAdobe PDFView/Open
04 aknowledgement.pdf254.95 kBAdobe PDFView/Open
05 contents.pdf386.77 kBAdobe PDFView/Open
06 chapter i.pdf1.04 MBAdobe PDFView/Open
07 chapter ii.pdf367.24 kBAdobe PDFView/Open
08 chapter iii.pdf2.54 MBAdobe PDFView/Open
09 chapter iv.pdf4.07 MBAdobe PDFView/Open
10 chapter v.pdf3.9 MBAdobe PDFView/Open
11 chapter vi.pdf204.79 kBAdobe PDFView/Open
12 references.pdf10.4 MBAdobe PDFView/Open


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