Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/197074
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DC FieldValueLanguage
dc.coverage.spatialPhysics
dc.date.accessioned2018-03-20T06:51:50Z-
dc.date.available2018-03-20T06:51:50Z-
dc.identifier.urihttp://hdl.handle.net/10603/197074-
dc.description.abstractAbstract available newline newline
dc.format.extent144p.
dc.languageEnglish
dc.relation-
dc.rightsuniversity
dc.titleDevelopment of high quality n_TCO thin films by PLD with novel applications for devices as value in commercial efforts
dc.title.alternative-
dc.creator.researcherRamamoorthy, K
dc.subject.keywordLaser-target
dc.subject.keywordOxides
dc.subject.keywordPhysical methods
dc.subject.keywordPhysics
dc.subject.keywordSemiconductors
dc.subject.keywordThin film formation
dc.description.noteAppendix given
dc.contributor.guideSanjeeviraja, C
dc.publisher.placeKaraikudi
dc.publisher.universityAlagappa University
dc.publisher.institutionDepartment of Physics
dc.date.registeredn.d.
dc.date.completed2005
dc.date.awardedn.d.
dc.format.dimensions-
dc.format.accompanyingmaterialNone
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Physics

Files in This Item:
File Description SizeFormat 
01_title.pdfAttached File232.36 kBAdobe PDFView/Open
02_certificate.pdf259.86 kBAdobe PDFView/Open
03_declaration.pdf196.15 kBAdobe PDFView/Open
04_acknowledgement.pdf69.97 kBAdobe PDFView/Open
05_contents.pdf95.63 kBAdobe PDFView/Open
06_abstract.pdf380.4 kBAdobe PDFView/Open
07_chapter 1.pdf1.37 MBAdobe PDFView/Open
08_chapter 2.pdf2.76 MBAdobe PDFView/Open
09_chapter 3.pdf1.99 MBAdobe PDFView/Open
10_chapter 4.pdf3.11 MBAdobe PDFView/Open
11_chapter 5.pdf1.27 MBAdobe PDFView/Open
12_chapter 6.pdf505.86 kBAdobe PDFView/Open
13_publications.pdf316.18 kBAdobe PDFView/Open
14_annexures.pdf4.03 MBAdobe PDFView/Open


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