Synthesis and Modification of Tin Oxide based Nanomaterials by Ion Beam

Abstract

The objective of thesis problem was to synthesize and modify tin oxide (SnO2) based newlinenanomaterials by swift heavy ion (SHI) beam irradiation using Pelletron Accelerator that might newlinehelp for future references in different fields of applications. The work discussed here represents newlinean attempt to understand the importance of SHI beam in modification of SnO2 based newlinenanomaterials. We had modified SnO2 based nanomaterials present in both (Crystalline and newlineAmorphous) phase by SHI beam. The synthesis of thin films was done by two different methods. newlineThese were electron beam evaporation and RF sputtering deposition techniques. These newlinedeposition techniques were bottom-up processes which were governed by external environmental newlineconditions such as nature of deposition technique, vacuum, atmosphere etc. The bottom-up newlineapproach provides more space to understanding physics in new dimensions than those newlinesynthesized by top-down approaches. Furthermore, involvement of SHI beam in material newlinemodification adds an extra hand to synthesize and modify nanomaterials for desired applications. newlineTo observe the effect of nature of ion beam in material modification (specifically SnO2 based), newlinewe had used two different beam irradiate at normal incidence, one with less mass (Ni-Nickel) newlineand other with relatively heavier mass (Au-Gold) keeping all other parameters identical such as newlinesame energy of 100 MeV, charge state and the irradiation fluence taken between 1×1011 to newline5×1013 ions.cm-2. This research work will provide a platform to understand the SHI beam effect newlineon material modification and help in choosing suitable ion beams for bringing in modifications in newlinedesired materials. To have a better understanding of the modified surface features, structural newlinephase transformation, optical, chemical, magnetic, electric, elemental composition and local newlineelectronic structure modification, we had studied in detail using different characterization newlinetechniques such as Atomic Force Microscopy-Magnetic Force Microscopy (AFM-MFM), newlineGlancing angle X-ray Diffraction (GAXRD)....