Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/156231
Title: Deposition and characterization of high k Gate dielectrics on GaAs for MOSFET applications
Researcher: Das, Tanmoy
Guide(s): Sutradhar, G., Bose, P.K. and Maiti, C.K.
Keywords: Dielectrics
High-K gate dielectric
Metal oxide semiconductor field-effect transistors
MOSFET Scaling
Semiconductor
University: Jadavpur University
Completed Date: 2012
Abstract: None
Pagination: xxv, 175p.
URI: http://hdl.handle.net/10603/156231
Appears in Departments:School of Automotive Engineering

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01_title.pdfAttached File83.61 kBAdobe PDFView/Open
02_dedication.pdf72.3 kBAdobe PDFView/Open
03_contents.pdf129.88 kBAdobe PDFView/Open
04_list of figures.pdf146.04 kBAdobe PDFView/Open
05_list of tables.pdf91.4 kBAdobe PDFView/Open
06_acknowledgment.pdf92.74 kBAdobe PDFView/Open
07_list of publications.pdf133.5 kBAdobe PDFView/Open
08_abstract.pdf98.71 kBAdobe PDFView/Open
09_chapter 1.pdf970.16 kBAdobe PDFView/Open
10_chapter 2.pdf1.12 MBAdobe PDFView/Open
11_chapter 3.pdf1.36 MBAdobe PDFView/Open
12_chapter 4.pdf1.22 MBAdobe PDFView/Open
13_chapter 5.pdf1.31 MBAdobe PDFView/Open
14_chapter 6.pdf857.53 kBAdobe PDFView/Open
15_chapter 7.pdf135.92 kBAdobe PDFView/Open
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