1. Shodhganga@INFLIBNET
  2. Anna University
  3. Faculty of Information and Communication Engineering
Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/141119
Title: Performance enhancement of double gate mosfets in sub micron technology using high K dielectric
Researcher: Flavia Princess Nesamani, I.
Guide(s): Lakshmi Prabha, V.
Keywords: Dielectric
Engineering
Gate
Micron
Mosfets
University: Anna University
Completed Date: february, 2015
Abstract: Abstract available
Pagination: xxviii, 176p.
URI: http://hdl.handle.net/10603/141119
Appears in Departments:Faculty of Information and Communication Engineering

Files in This Item:
File Description SizeFormat 
01_title page.pdfAttached File71.17 kBAdobe PDFView/Open
02_certificate.pdf276.62 kBAdobe PDFView/Open
03_abstract.pdf58.02 kBAdobe PDFView/Open
04_acknowledgement.pdf67.45 kBAdobe PDFView/Open
05_table of contents.pdf58.46 kBAdobe PDFView/Open
06_list of tables.pdf56.47 kBAdobe PDFView/Open
07_list of figures.pdf85.83 kBAdobe PDFView/Open
08_list of symbols and abbreviations.pdf80.79 kBAdobe PDFView/Open
09_chapter 1.pdf179.17 kBAdobe PDFView/Open
10_chapter 2.pdf159.73 kBAdobe PDFView/Open
11_chapter 3.pdf1.16 MBAdobe PDFView/Open
12_chapter 4.pdf431.63 kBAdobe PDFView/Open
13_chapter 5.pdf753.27 kBAdobe PDFView/Open
14_chapter 6.pdf863.32 kBAdobe PDFView/Open
15_conclusion and future work.pdf70.24 kBAdobe PDFView/Open
16_references.pdf165.75 kBAdobe PDFView/Open
17_list of publications.pdf97.98 kBAdobe PDFView/Open
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