1. Shodhganga@INFLIBNET
  2. Alagappa University
  3. Department of Physics
Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/134163
Title: Physical and Chemical properties of PVD deposited v2o5 Thin films for Electrocatalytic and Optoelectronic Applications
Researcher: Shrividhya,T
Guide(s): Ravi,G
Keywords: Applications
Electrocatalytic and Optoelectronic
Physical and Chemical properties
PVD deposited
v2o5 Thin films
University: Alagappa University
Completed Date: 16/06/2016
Abstract: newline
Pagination: xx,280p.
URI: http://hdl.handle.net/10603/134163
Appears in Departments:Department of Physics

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01_title(0420).pdfAttached File66.61 kBAdobe PDFView/Open
02_declaration.pdf71.57 kBAdobe PDFView/Open
03_certificate.pdf68.69 kBAdobe PDFView/Open
04_acknowledgements.pdf96.63 kBAdobe PDFView/Open
05_contents.pdf289.04 kBAdobe PDFView/Open
06_list_of_figures.pdf162.63 kBAdobe PDFView/Open
07_list_of_tables.pdf75.34 kBAdobe PDFView/Open
09_chapter_1.pdf357.76 kBAdobe PDFView/Open
10_chapter_2.pdf688.44 kBAdobe PDFView/Open
11_chapter_3.pdf1.27 MBAdobe PDFView/Open
12_chapter_4.pdf1.66 MBAdobe PDFView/Open
13_chapter_5.pdf3.34 MBAdobe PDFView/Open
14_chapter_6.pdf3.28 MBAdobe PDFView/Open
15_chapter_7.pdf3.22 MBAdobe PDFView/Open
16_chapter_8(summary and conclusion).pdf228 kBAdobe PDFView/Open
17_references.pdf184.52 kBAdobe PDFView/Open
18_publications.pdf110.97 kBAdobe PDFView/Open
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