Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/133563
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dc.coverage.spatialElectronic Science
dc.date.accessioned2017-02-02T12:03:35Z-
dc.date.available2017-02-02T12:03:35Z-
dc.identifier.urihttp://hdl.handle.net/10603/133563-
dc.description.abstractAbstract not available newline newline
dc.format.extent179p.
dc.languageEnglish
dc.relation-
dc.rightsuniversity
dc.titleDevelopment and characterization of novel masking materials _polymers_ for silicon micromachining
dc.title.alternative-
dc.creator.researcherBodas, Dhananjay S
dc.subject.keywordMicromachining, Fourier transform infrared spectroscopy, Pmma films, Re sputtering, Xps analysis
dc.description.note-
dc.contributor.guideGangal, S A
dc.publisher.placePune
dc.publisher.universitySavitribai Phule Pune University
dc.publisher.institutionDepartment of Electronic Science
dc.date.registeredn.d
dc.date.completed2004
dc.date.awardedn.d.
dc.format.dimensions-
dc.format.accompanyingmaterialNone
dc.source.universityUniversity
dc.type.degreePh.D.
Appears in Departments:Department of Electronic Science

Files in This Item:
File Description SizeFormat 
01_title.pdfAttached File24.29 kBAdobe PDFView/Open
02_declaration.pdf188.37 kBAdobe PDFView/Open
03_acknowledgement.pdf78.58 kBAdobe PDFView/Open
04_contents.pdf111.86 kBAdobe PDFView/Open
05_list of figures.pdf167.46 kBAdobe PDFView/Open
06_list of tables.pdf24.51 kBAdobe PDFView/Open
07_list of acronyms.pdf83.06 kBAdobe PDFView/Open
08_chapter 1.pdf4.17 MBAdobe PDFView/Open
09_chapter 2.pdf5.79 MBAdobe PDFView/Open
10_chapter 3.pdf3.51 MBAdobe PDFView/Open
11_chapter 4.pdf2.66 MBAdobe PDFView/Open
12_chapter 5.pdf1.54 MBAdobe PDFView/Open
13_chapter 6.pdf1.62 MBAdobe PDFView/Open
14_chapter 7.pdf248.61 kBAdobe PDFView/Open
15_list of publications.pdf117.65 kBAdobe PDFView/Open


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