Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/133563
Title: Development and characterization of novel masking materials _polymers_ for silicon micromachining
Researcher: Bodas, Dhananjay S
Guide(s): Gangal, S A
Keywords: Micromachining, Fourier transform infrared spectroscopy, Pmma films, Re sputtering, Xps analysis
University: Savitribai Phule Pune University
Completed Date: 2004
Abstract: Abstract not available newline newline
Pagination: 179p.
URI: http://hdl.handle.net/10603/133563
Appears in Departments:Department of Electronic Science

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01_title.pdfAttached File24.29 kBAdobe PDFView/Open
02_declaration.pdf188.37 kBAdobe PDFView/Open
03_acknowledgement.pdf78.58 kBAdobe PDFView/Open
04_contents.pdf111.86 kBAdobe PDFView/Open
05_list of figures.pdf167.46 kBAdobe PDFView/Open
06_list of tables.pdf24.51 kBAdobe PDFView/Open
07_list of acronyms.pdf83.06 kBAdobe PDFView/Open
08_chapter 1.pdf4.17 MBAdobe PDFView/Open
09_chapter 2.pdf5.79 MBAdobe PDFView/Open
10_chapter 3.pdf3.51 MBAdobe PDFView/Open
11_chapter 4.pdf2.66 MBAdobe PDFView/Open
12_chapter 5.pdf1.54 MBAdobe PDFView/Open
13_chapter 6.pdf1.62 MBAdobe PDFView/Open
14_chapter 7.pdf248.61 kBAdobe PDFView/Open
15_list of publications.pdf117.65 kBAdobe PDFView/Open
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