Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/125764
Title: Design and development of a 200 KEV high current ion implanter and some studies on ion beam induced surface modification
Researcher: Kulkarni, Sunil A
Guide(s): Ogale, S B
Keywords: 200 KEV High Current Ion Implanter, Ion Beam Induced Surface, Duoplasmatron, RF Discharge, Hollow Cathode
University: Savitribai Phule Pune University
Completed Date: n.d.
Abstract: Abstract not available newline newline
Pagination: 125p.
URI: http://hdl.handle.net/10603/125764
Appears in Departments:Department of Physics

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01_certificate.pdfAttached File22.55 kBAdobe PDFView/Open
02_acknowledgement.pdf71.16 kBAdobe PDFView/Open
03_index.pdf53.75 kBAdobe PDFView/Open
04_chapter 1.pdf999.96 kBAdobe PDFView/Open
05_chapter 2.pdf2.12 MBAdobe PDFView/Open
06_chapter 3.pdf2.11 MBAdobe PDFView/Open
07_chapter 4.pdf487.99 kBAdobe PDFView/Open
08_chapter 5.pdf515.06 kBAdobe PDFView/Open
09_appendix.pdf356.09 kBAdobe PDFView/Open
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