Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/148898
Title: Deposition and characterization of high k dielectric thin films for mos capacitors
Researcher: Khairnar, Anil Gulabrao
Guide(s): Mahajan, A M
Keywords: Characterization
Deposition
Dielectric
Film
University: North Maharashtra University
Completed Date: 2015
Abstract: None
Pagination: n.d.
URI: http://hdl.handle.net/10603/148898
Appears in Departments:Department of Electronics Engineering and Technology

Files in This Item:
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01_title.pdfAttached File29.41 kBAdobe PDFView/Open
02_dedication.pdf58.99 kBAdobe PDFView/Open
03_certificate.pdf119.22 kBAdobe PDFView/Open
04_declaration.pdf11.05 kBAdobe PDFView/Open
05_acknowledment.pdf16.63 kBAdobe PDFView/Open
06_contents.pdf18.4 kBAdobe PDFView/Open
07_list of figures.pdf21.97 kBAdobe PDFView/Open
08_list of tables.pdf42.44 kBAdobe PDFView/Open
09_abbreviations.pdf15.05 kBAdobe PDFView/Open
10_publication.pdf33.88 kBAdobe PDFView/Open
11_chapter 1.pdf361.34 kBAdobe PDFView/Open
12_chapter 2.pdf256.46 kBAdobe PDFView/Open
13_chapter 3.pdf3.49 MBAdobe PDFView/Open
14_chapter 4.pdf267.05 kBAdobe PDFView/Open
15_chapter 5.pdf2.87 MBAdobe PDFView/Open
16_chapter 6.pdf34.51 kBAdobe PDFView/Open


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