Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/92988
Title: Simulation of energetic electron beam interaction with resist on semiconductor substrates using Monte Carlo process and its application to e_beam lithography
Researcher: Singh, Moirangthem Shubhakanta
Guide(s): Indrajit Sharma, B and Khatri, R K
Keywords: Electron-Solid Interactions, Elastic Scattering, Monte Carlo Method, Lithographic Strategies, X-Ray Lithography
University: Assam University
Completed Date: 2010
Abstract: Abstract available newline newline
Pagination: Xvi, 110p.
URI: http://hdl.handle.net/10603/92988
Appears in Departments:Department of Physics

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01_title.pdfAttached File304.76 kBAdobe PDFView/Open
02_declaration.pdf32.7 kBAdobe PDFView/Open
03_certificate.pdf59.28 kBAdobe PDFView/Open
04_acknowledgement.pdf88.7 kBAdobe PDFView/Open
05_contents.pdf72.38 kBAdobe PDFView/Open
06_list of figures and tables.pdf175.34 kBAdobe PDFView/Open
07_abstract.pdf179.72 kBAdobe PDFView/Open
08_chapter 1.pdf830.83 kBAdobe PDFView/Open
09_chapter 2.pdf691.43 kBAdobe PDFView/Open
10_chapter 3.pdf366.62 kBAdobe PDFView/Open
11_chapter 4.pdf255.3 kBAdobe PDFView/Open
12_chapter 5.pdf1.02 MBAdobe PDFView/Open
13_chapter 6.pdf1.18 MBAdobe PDFView/Open
14_research publications.pdf24.79 kBAdobe PDFView/Open
15_references.pdf176.75 kBAdobe PDFView/Open


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