Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/82951
Title: ECR based plasma assisted chemical etching of semiconductors
Researcher: Bhardwaj, Ram Krishan
Guide(s): Bharadwaj, Lalit M
Keywords: Cyclotron
Electron
Etching
Plasma
Semiconductors
University: Panjab University
Completed Date: 31/12/2006
Abstract: Abstract available
Pagination: ix, 90p.
URI: http://hdl.handle.net/10603/82951
Appears in Departments:Department of Physics

Files in This Item:
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01_title page.pdfAttached File39.38 kBAdobe PDFView/Open
02_dedication.pdf21.25 kBAdobe PDFView/Open
03_acknowledgement.pdf113.83 kBAdobe PDFView/Open
04_content.pdf108.41 kBAdobe PDFView/Open
05_abstract.pdf163.52 kBAdobe PDFView/Open
06_chapter 1.pdf1.12 MBAdobe PDFView/Open
07_chapter 2.pdf1.91 MBAdobe PDFView/Open
08_chapter 3.pdf1.68 MBAdobe PDFView/Open
09_chapter 4.pdf1.1 MBAdobe PDFView/Open
10_conclusion.pdf182.25 kBAdobe PDFView/Open
11_list of figures.pdf121.22 kBAdobe PDFView/Open
12_publication.pdf84.06 kBAdobe PDFView/Open


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