Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/80519
Title: Application of glow discharge plasma processing in material analysis etching and deposition
Researcher: Kumar, Ashok
Guide(s): Bajpai, R P
Keywords: Debye
Fluorine
Ionization
Oxygen
plasma
University: Panjab University
Completed Date: 31/12/2009
Abstract: Abstract not available
Pagination: ciii, 107p.
URI: http://hdl.handle.net/10603/80519
Appears in Departments:Department of Physics

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01_title page.pdfAttached File33.73 kBAdobe PDFView/Open
02_dedication.pdf16.36 kBAdobe PDFView/Open
03_acknowledgement.pdf121.04 kBAdobe PDFView/Open
04_abstract.pdf319.84 kBAdobe PDFView/Open
05_content.pdf333.01 kBAdobe PDFView/Open
06_list of figures.pdf428.88 kBAdobe PDFView/Open
07_list of table.pdf31.3 kBAdobe PDFView/Open
08_list of symbol and abbreviations.pdf125.28 kBAdobe PDFView/Open
09_list of publication.pdf279.02 kBAdobe PDFView/Open
10_chapter 1.pdf1.88 MBAdobe PDFView/Open
11_chapter 2.pdf5.8 MBAdobe PDFView/Open
12_chapter 3.pdf4.28 MBAdobe PDFView/Open
13_chapter 4.pdf4.33 MBAdobe PDFView/Open
14_chapter 5.pdf1.86 MBAdobe PDFView/Open
15_chapter 6.pdf2.16 MBAdobe PDFView/Open
16_chapter 7.pdf7.7 MBAdobe PDFView/Open
17_chapter 8.pdf3.06 MBAdobe PDFView/Open
18_annexure.pdf10.04 MBAdobe PDFView/Open


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