Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/140179
Title: Preparation and characterization of pure and doped niobium oxide nb2o5 thin films for device applications
Researcher: Usha, N
Guide(s): Sivakumar, R
Keywords: nb2o5 thin films
pure and doped niobium oxide
University: Alagappa University
Completed Date: 
Abstract: newline
Pagination: xi, 121p.
URI: http://hdl.handle.net/10603/140179
Appears in Departments:Department of Physics

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01_title.pdfAttached File110.32 kBAdobe PDFView/Open
02_certificate.pdf129.61 kBAdobe PDFView/Open
03_declaration.pdf84.09 kBAdobe PDFView/Open
04_acknowledgement.pdf565.72 kBAdobe PDFView/Open
05_abstract.pdf1.12 MBAdobe PDFView/Open
06_content.pdf745.37 kBAdobe PDFView/Open
07_chapter 1.pdf13.37 MBAdobe PDFView/Open
08_chapter 2.pdf5.66 MBAdobe PDFView/Open
09_chapter 3.pdf6.25 MBAdobe PDFView/Open
10_chapter 4.pdf12.42 MBAdobe PDFView/Open
11_chapter 5.pdf11.21 MBAdobe PDFView/Open
12_chapter 6.pdf34.01 MBAdobe PDFView/Open
13_publications.pdf403.95 kBAdobe PDFView/Open


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