Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/139868
Title: Synthesis characterization and lithographic evaluation of plasma polymerized and#945;_methylstyrene and chlorinated and#945;_methylstyrene as e_beam resist
Researcher: Gosavi, Suresh
Guide(s): Gangal, S A
Keywords: Vlsi manufacturing technology, Resist synthesis, E-beam lithography, Pattern inspection, Ftir technique
University: Savitribai Phule Pune University
Completed Date: 1995
Abstract: Abstract not available newline newline
Pagination: xiv, 92p.
URI: http://hdl.handle.net/10603/139868
Appears in Departments:Department of Electronic Science

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/01_title.pdfAttached File23.2 kBAdobe PDFView/Open
01_title.pdf23.2 kBAdobe PDFView/Open
/02_certificate.pdf157.58 kBAdobe PDFView/Open
02_certificate.pdf157.58 kBAdobe PDFView/Open
03_acknowledgement.pdf93.81 kBAdobe PDFView/Open
04_contents.pdf64.19 kBAdobe PDFView/Open
05_list of tables.pdf22.26 kBAdobe PDFView/Open
06_list of figures.pdf90.82 kBAdobe PDFView/Open
07_list of acronyms.pdf54.92 kBAdobe PDFView/Open
08_list of symbols.pdf114.51 kBAdobe PDFView/Open
09_chapter 1.pdf5.75 MBAdobe PDFView/Open
10_chapter 2.pdf3.3 MBAdobe PDFView/Open
11_chapter 3.pdf3.88 MBAdobe PDFView/Open
12_chapter 4.pdf1.59 MBAdobe PDFView/Open
13_list of publications.pdf54.31 kBAdobe PDFView/Open


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